Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• : grafted brush layer, chemical pattern creation and brush/block co-polymer interface. Keywords: block copolymer; chemical guiding pattern; directed self-assembly; thin film; X-ray photoemission spectroscopy; Introduction Directed self-assembly (DSA) of block copolymers (BCPs) is a chemical-based

• chemical guiding pattern, it is important to determine which chemical interactions occur between both modified and unmodified regions of the substrate with each block of the copolymer. One technique especially suited for the characterization of buried interfaces is hard X-ray high kinetic energy

• contributes to the alignment of the BCP, as shown in Figure 6b. Now, we focus the analysis on the sample prepared by PON. Figure 7a shows an AFM image of a chemical guiding pattern created by PON. The effect of the brush modification is an effective replication of the DVD pattern with modified regions